JPS5883844A - 感光性組成物 - Google Patents

感光性組成物

Info

Publication number
JPS5883844A
JPS5883844A JP18199581A JP18199581A JPS5883844A JP S5883844 A JPS5883844 A JP S5883844A JP 18199581 A JP18199581 A JP 18199581A JP 18199581 A JP18199581 A JP 18199581A JP S5883844 A JPS5883844 A JP S5883844A
Authority
JP
Japan
Prior art keywords
photosensitive
acid
composition
group
free radical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP18199581A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0157777B2 (en]
Inventor
Teruo Nagano
長野 照男
Takao Nakayama
隆雄 中山
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP18199581A priority Critical patent/JPS5883844A/ja
Publication of JPS5883844A publication Critical patent/JPS5883844A/ja
Publication of JPH0157777B2 publication Critical patent/JPH0157777B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
JP18199581A 1981-11-13 1981-11-13 感光性組成物 Granted JPS5883844A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP18199581A JPS5883844A (ja) 1981-11-13 1981-11-13 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP18199581A JPS5883844A (ja) 1981-11-13 1981-11-13 感光性組成物

Publications (2)

Publication Number Publication Date
JPS5883844A true JPS5883844A (ja) 1983-05-19
JPH0157777B2 JPH0157777B2 (en]) 1989-12-07

Family

ID=16110478

Family Applications (1)

Application Number Title Priority Date Filing Date
JP18199581A Granted JPS5883844A (ja) 1981-11-13 1981-11-13 感光性組成物

Country Status (1)

Country Link
JP (1) JPS5883844A (en])

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0285859A (ja) * 1988-09-22 1990-03-27 Fuji Photo Film Co Ltd 感光性組成物
JPH02100055A (ja) * 1988-10-07 1990-04-12 Fuji Photo Film Co Ltd ポジ型感光性組成物
US4980268A (en) * 1988-03-17 1990-12-25 Ciba-Geigy Corporation Negative photoresists of the polyimide type containing 1,2-disulfones
JPH03289658A (ja) * 1990-04-06 1991-12-19 Fuji Photo Film Co Ltd ポジ画像の形成方法
JPH0527425A (ja) * 1991-01-24 1993-02-05 Fuji Photo Film Co Ltd 感光性組成物
US5717003A (en) * 1988-08-03 1998-02-10 Ciba Specialty Chemicals Corporation Acid-curable binder systems containing 1,2-disulfones
US6156815A (en) * 1988-08-03 2000-12-05 Ciba Specialty Chemicals Corporation Acid-curable binder systems containing 1,2-disulfones

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4980268A (en) * 1988-03-17 1990-12-25 Ciba-Geigy Corporation Negative photoresists of the polyimide type containing 1,2-disulfones
US5717003A (en) * 1988-08-03 1998-02-10 Ciba Specialty Chemicals Corporation Acid-curable binder systems containing 1,2-disulfones
US5985950A (en) * 1988-08-03 1999-11-16 Ciba Specialty Chemicals Corporation Acid-curable binder systems containing 1,2 disulfones
US6156815A (en) * 1988-08-03 2000-12-05 Ciba Specialty Chemicals Corporation Acid-curable binder systems containing 1,2-disulfones
JPH0285859A (ja) * 1988-09-22 1990-03-27 Fuji Photo Film Co Ltd 感光性組成物
JPH02100055A (ja) * 1988-10-07 1990-04-12 Fuji Photo Film Co Ltd ポジ型感光性組成物
JPH03289658A (ja) * 1990-04-06 1991-12-19 Fuji Photo Film Co Ltd ポジ画像の形成方法
JPH0527425A (ja) * 1991-01-24 1993-02-05 Fuji Photo Film Co Ltd 感光性組成物

Also Published As

Publication number Publication date
JPH0157777B2 (en]) 1989-12-07

Similar Documents

Publication Publication Date Title
US5064741A (en) Positive working light-sensitive composition containing a free radical generator and a discoloring agent
JPS6151788B2 (en])
US3130048A (en) Presensitized printing plates comprising naphthoquinone-1, 2-diazide reproduction layrs
JPS60239736A (ja) 感光性組成物
HK78590A (en) Light-sensitive compounds containing trichloromethyl groups, process for their preparation and light-sensitive mixture containing these compounds
JPH0342462B2 (en])
US4460674A (en) Posi-type quinone diazide photosensitive composition with sensitizer therefor
EP0424124B1 (en) Positive-acting photoresist compositions
JPS60177340A (ja) 感光性組成物
JP2599007B2 (ja) ポジ型感光性組成物
US5338643A (en) O-quinonediazide photosensitive composition containing s-triazine compound, novolak resin, vinyl-based polymer and a dye
US5698369A (en) Photosensitive composition comprising a sulfonimide compound according to the formula R1 -SO2 -NR3 -SO2 -R2 wherein R1, R2 and R3 each represents an aromatic group or an alkyl group
JPS5883844A (ja) 感光性組成物
JPS6353992B2 (en])
US3494767A (en) Copying material for use in the photochemical preparation of printing plates
FR2503399A1 (fr) Composition photosensible procurant une image visible par exposition
JPS6120939A (ja) 平版印刷版用感光性組成物
US5256522A (en) Image reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curing
JP3078152B2 (ja) 感光性組成物
US5200293A (en) Photoresist composition containing specific amounts of a naphthoquinone diazide sulfonyl ester of tetrahydroxy diphenyl sulfide and a polyhydroxy compound
JPH02118645A (ja) ポジ型放射線感受性組成物およびそれで製造した放射線感受性記録材料
JPH04204453A (ja) 感光性組成物
JPS63157147A (ja) 感光性組成物および感光性平版印刷版
JP2754304B2 (ja) 感光性平版印刷版
JPH0545875A (ja) 感光性組成物